- ^d000003429777
- Text(188 character(s))
- Korean English
- 1,400 P
Engineering/Technology
Completed
이 이슈는 100M Pixel CIS 제품을 위한 최신 공정에서 발견된 것으로, partition test를 통해 원인으로 지목된 것는 BSR part입니다. high bias sputtering과 strong O2 WAC으로부터 Chamber wall에 Y2O3가 형성되어 Fluorine을 scavenge 하는 것으로 밝혀 졌습니다.
5 years ago
Deleted
Intermediate
This issue has been found in the latest process for 100M Pixel CIS product, and partition test have determined that BSR part is the cause. As a result of the formation of Y2O3 in the Chamber wall from high bus sputtering and strong O2 WAC, it was found Fluorine is scavenged.
5 years ago
Fluent
Native language
This issue was found during the latest process for 100M Pixel CIS product, and BSR part was blamed for the cause through partition test. It turned out that Y203 formed at Chamber wall from high bias sputtering and strong O2 WAC scavenged Fluorine.